Industrial etching: Difference between revisions
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#REDIRECT [[Chemical milling]] |
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{{other uses|Etching (disambiguation)}} |
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In [[industry]], '''etching''' (sometimes called ''chemical [[milling]]'' or '''wet etching''') is the process of using [[acid]]s, [[Base (chemistry)|base]]s or other [[chemical]]s to dissolve away unwanted materials such as [[metal]]s, [[semiconductor]] materials or glass. It has applications in the [[printed circuit board]] and [[semiconductor]] fabrication industries. |
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== History of etching == |
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The process is known to have been used in Europe in the [[middle ages]], where it was applied to the decoration of [[armour]]. One such craftsman, [[Daniel Hopfer]] (circa [[1470]]-[[1536]]) of [[Augsburg]], Germany, is credited with being the first person to apply the method to [[printmaking]]. |
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== Common etchants == |
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Commonly used etchants for copper are: |
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*Iron (III) Chloride [[Ferric chloride]] |
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*[[Ammonium persulfate]] |
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*[[Ammonia]] |
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[[Hydrofluoric acid]] (HF) is a very efficient etchant for [[silicon dioxide]]. It is however very dangerous if it comes into contact with the body. |
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== Etching in the semiconductor industry == |
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:{{main|Etching (microfabrication)}} |
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Etching is used widely to manufacture [[integrated circuit]]s and [[MEMS]]. In addition to the standard, liquid-based techniques, the semiconductor industry commonly uses [[plasma etching]]. |
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== See also == |
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* [[Etching (art)]], for printmaking and related uses |
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==External Links== |
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*http://www.cmrmfg.com - CMR Manufacturing Inc. is the premier Photochemical and Leadframe Machining manufacturer in the South West (USA presumably) and serves a global market. |
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{{engineering-stub}} |
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[[Category:Manufacturing]] |
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[[de:Ätzen]] |
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[[ko:웨트 에칭]] |
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[[ja:ウェットエッチング]] |
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Latest revision as of 17:35, 12 February 2013
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