Burn-Jeng Lin
Burn-Jeng Lin (Chinese: 林本堅; born 1942) is a Taiwanese engineer.
Lin earned his doctorate from Ohio State University in 1970.[1] While working for TSMC, Lin became the first to propose immersion lithography, a technique that became viable in the 1980s.[2][3] He was named an IEEE Fellow in 2003, and granted an equivalent honor by the SPIE. The next year, SPIE gave Lin the inaugural Frits Zernike Award.[4] In 2008, Lin was elected to membership of the United States National Academy of Engineering "[f]or technical innovations and leadership in the development of lithography for semiconductor manufacturing."[5] Lin received the IEEE Cledo Brunetti Award and IEEE Jun-ichi Nishizawa Medal in 2009 and 2013 respectively.[1][3] In 2014, Lin was named a member of Academia Sinica.[4] Upon his retirement from TSMC, he was offered a position on the faculty of National Tsing Hua University.[4][6]
References
- ^ a b "ECE Alum Burn Lin receives IEEE Jun-ichi Nishizawa Medal". Ohio State University. 30 April 2013. Retrieved 2 December 2018.
- ^ Burn J. Lin (1987). "The future of subhalf-micrometer optical lithography". Microelectronic Engineering 6, 31–51
- ^ a b Handy, Jim (26 June 2013). "Father of Immersion Litho Receives Award". Forbes. Retrieved 2 December 2018.
- ^ a b c "Semiconductor Pioneer Burn Lin Joins NTHU". National Tsing Hua University. 2016. Retrieved 2 December 2018.
- ^ "Dr. Burn Jeng Lin". United States National Academy of Engineering. Retrieved 2 December 2018.
- ^ "TSMC Burn Lin Academic Salon". 2016. Retrieved 2 December 2018.
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