Arc evaporation
Arc evaporation or Arc-PVD (also arc evaporation , from English arc , arc ') is a coating method from the group of physical vapor deposition (PVD), more specifically an evaporation method .
In this process, an arc burns between the chamber and the target, which is at negative potential . B. on a workpiece (the substrate ) to be applied target material melts and evaporates. The target acts as a cathode, the chamber wall of the vacuum chamber or a defined electrode acts as an anode. A large part (up to 90%) of the vaporized material is ionized . The material vapor (target material) spreads radially from the target , similar to thermal evaporation . Since a negative potential is also applied to the substrate, the ionized material vapor is also accelerated towards the substrate. The material vapor condenses on the substrate surface . Due to the high proportion of ionization, high kinetic energy can be introduced into the metal vapor through corresponding voltages on the substrate and target, so that a more or less strong sputtering effect can be achieved on the substrate . This is used, among other things, to influence the properties (layer adhesion, density, composition, etc.) of the deposited layer.
literature
- Donald M. Mattox: Handbook of Physical Vapor Deposition (PVD) Processing: Film Formation, Adhesion, Surface Preparation and Contamination Control . Noyes Pubn, 1998, ISBN 0-8155-1422-0 .
- André Anders: Cathodic Arcs - From Fractal Spots to Energetic Condensation . Springer, 2008, ISBN 978-0-387-79107-4 .
- André Anders: The evolution of ion charge states in cathodic vacuum arc plasmas: a review . In: Plasma Sources Science and Technology . tape 21 , no. 3 , June 1, 2012, p. 035014 , doi : 10.1088 / 0963-0252 / 21/3/035014 ( draft version ).
Individual evidence
- ↑ W. König, R. Fritsch, O. Knotek, G. Krämer: Arc-PVD coating of hard metals and analysis of the functional behavior during machining in the interrupted cut . In: Materials Science and Technology . tape 24 , no. 3–4 , 2004, pp. 131–141 , doi : 10.1002 / mawe.19930240312 .