Hans Oechsner

Hans Oechsner (born February 21, 1934 in Nuremberg ) is a German physicist and university professor. From 1981 to 2000 he was professor for technical physics at the University of Kaiserslautern .

Life

Hans Oechsner studied physics with mathematics and chemistry at the University of Würzburg . After graduating in 1960 with a thesis on low-pressure plasmas with Hans Fetz, he turned to surface physics and received his doctorate in 1963 in Würzburg with a dissertation on emission processes in ion-surface interaction.

From 1965 he was a lecturer for solid state physics in Würzburg and in 1968 he was a visiting scientist at the Institute for High Frequency Technology at ETH Zurich . In the winter semester 1971/72 he qualified as a professor for experimental physics at the University of Würzburg and shortly afterwards accepted a professorship for physics at the TU Clausthal . In 1981 he was appointed to the chair for technical physics at the University of Kaiserslautern , which he held until 2000.

Research stays took him to the IBM Almaden Research Lab in San Jose (USA), the Material Science Department of Univ. of California in Los Angeles (USA), the Applied Physics Department of Univ. of Science in Okayama (Japan) and the Industrial Technology Research Institute ITRI ​​in Hsinchu (Taiwan). 2001–2007 he was an external researcher at the Univ. of Science in Okayama. Since 2002 he has been working as a scientific and technical consultant.

Act

Oechsner is one of the pioneers of the sputtering technology used worldwide for the deposition of thin layers and of modern electron and mass spectrometric methods for surface and thin layer analysis. These include the secondary neutral particle mass spectrometry (SNMS) and electron work function microscopy (WFS) developed by him . In addition to the emission processes during low-energy ion bombardment of solid surfaces, resonantly excited high-frequency low-pressure plasmas and the development of large-area ion and plasma beam sources, the deposition of hard layers based on nitride (TiN, cBN) and carbon as well as chemical solid-state reactions and diffusion processes on surfaces and in thin layers were other research areas . In 1985 he became the founding spokesman for the state research focus on materials science at the University of Kaiserslautern, where he headed the Institute for Surface and Layer Analysis IFOS, which he founded in 1989, from 1990 to 2002. From 1976 to 1982 he was chairman of the joint technical committee for thin layers of the German Physical Society DPG and the German Vacuum Society DVG, from 1992 to 1995 chairman of the Applied Surface Science Division of the International Union of Vacuum Science, Techniqes and Applications IUVSTA and from 1995 to 2002 president the DVG. Until 1994 he organized and headed the AOFA workshops for applied surface analysis, alternating with H. Nickel, Jülich. He was the founder of the Int. Workshops on Postionization Techniques in Surface Analysis PITSA and editor of Spectrochimica Acta 1986–88, the Journal de Physique III 1996–97 and the European Physical Journal –Applied Physics 1998–2002.

Awards and honors

• 1987 Technology Transfer Prize of the Federal Republic of Germany
• 1989 Scientific Member of the Bohemian Physical Society (USA)
• 1998 Honorary member of the German Working Group on Applied Spectroscopy of the Society of German Chemists
• 2000 Prize of the German-Luxembourg Society for Scientific Cooperation
• 2003 honorary member of the German Vacuum Society
• 2007 NanoSmat Lecture Award
• 2011 Honorary Member of the Clausius Tower Society, Koszalin (Poland)
• 2014 Badge of Honor from the German Vacuum Society

Publications

7 patents, approx. 300 scientific articles and book chapters, a. a.

• Thin Film and Depth Profile Analysis. Springer, Heidelberg 1984.
• Sputtering - A Review of Some Recent Experimental and Theoretical Aspects . Appl. Phys. 1975, 8: 185-198.
• together with J. Waldorf et al. GK Wolf: Particle beam assisted method. in: Vakuumbeschichtung 2, Eds. G. Kienel, K. Röll, Düsseldorf 1995, 193-260.
• Resonant Plasma Excitation by Electron Cyclotron Waves - Fundamentals and Applications , in: Plasma Processing of Semiconductors, Ed. PF Williams, Heidelberg 1997, 157-180.
• Secondary Neutral Mass Spectrometry with Plasma Post-Ionization , in: Encyclopedia of Mass Spectrometry, ed. ML Gross u. a., Amsterdam 2010, Vol. 5, 455-69.

Individual evidence

1. ↑ Review article - German Vacuum Society DVG. Retrieved March 30, 2017 .